{"id":826,"date":"2023-05-19T22:15:19","date_gmt":"2023-05-19T22:15:19","guid":{"rendered":"https:\/\/sites.rutgers.edu\/mcf\/?page_id=826"},"modified":"2023-08-30T12:30:20","modified_gmt":"2023-08-30T12:30:20","slug":"capabilities-and-charges","status":"publish","type":"page","link":"https:\/\/sites.rutgers.edu\/ncf\/capabilities-and-charges\/","title":{"rendered":"Capabilities and Charges"},"content":{"rendered":"<p><strong>Fabrication Tools<\/strong><\/p>\n<ul>\n<li>Atomic Layer Deposition<\/li>\n<li>Ebeam (Liquid N2)<\/li>\n<li>Ebeam (Angstorm)<\/li>\n<li>Ion Milling (Angstorm)<\/li>\n<li>PECVD_Plasma Therm<\/li>\n<li>PECVD_Unaxis<\/li>\n<li>Trion Reactive Ion Etch<\/li>\n<li>Plasma Treatment_Barrel Etcher<\/li>\n<li>Rapid Thermal Anneal<\/li>\n<li>Sputter_Denton-DV502<\/li>\n<li>Sputter_Sys &amp; Des Fab<\/li>\n<li>Furnace_Boron<\/li>\n<li>Furnace_Phosphorus<\/li>\n<li>Furnace_Oxidation<\/li>\n<li>Furnace_Anneal\/FGA<\/li>\n<li>Box Furnace (Thermcraft)_O2 and N2 only<\/li>\n<li>Box Furnace (ThermoScientific)_FGA and N2 only<\/li>\n<li>UVozone Cleaner<\/li>\n<li>Polisher\/Grinder<\/li>\n<li>Laser Scribing, Marking and Ablation (Innotech)<\/li>\n<li>Thermal Evaporator (Logitek)<\/li>\n<li>Wafer Spin Rinse Dryer<\/li>\n<li>Photoresist Spinner (Laurel)<\/li>\n<li>Mask Aligner (Karl-Suss MJB3)<\/li>\n<\/ul>\n<p><strong>Wet Chemical Process<\/strong><\/p>\n<ul>\n<li>Silicon Etch (HF:HNO3)<\/li>\n<li>Silicon Etch (TMAH)<\/li>\n<li>Silicon Surface Texturing (TMAH)<\/li>\n<li>Caro Etch (H2SO4:H2O2)<\/li>\n<li>Aluminum Etch (H4PO4:HNO3:CH3COOH)<\/li>\n<li>RCA Clean (NH3:H2O2:H2O, HCL:H2O2:H2O)<\/li>\n<li>Palladium Etch (CH3COOH:HNO3:HCL)<\/li>\n<li>Boiling HNO3 for oxide growth<\/li>\n<li>Buffered Oxide Etch<\/li>\n<li>Silver Etch (HNO3)<\/li>\n<li>Oxide\/Nitride Etch (HF fume)<\/li>\n<\/ul>\n<p><strong>Characterization Tools<\/strong><\/p>\n<ul>\n<li>Detek Non-Contact Profilometer<\/li>\n<li>UV-Vis-NIR Spectroscopy<\/li>\n<li>Photoluminescence (PL) Spectroscopy<\/li>\n<li>Photoconductance (PCD), SunsVoc<\/li>\n<li>LCR Meter<\/li>\n<li>Ellipsometry<\/li>\n<li>Contact Resistivity Measurement<\/li>\n<li>4-Point-Probe (Ossila)<\/li>\n<li>Film Metric<\/li>\n<li>Optical Microscope<\/li>\n<li>UV &amp; Solar Simulator<\/li>\n<li>Scanning Electron Microscope (SEM)<\/li>\n<li>Energy Dispersive Spectroscopy (EDS)<\/li>\n<li>Electron-Beam Lithography (EBL)<\/li>\n<\/ul>\n<p>&nbsp;<\/p>\n<table width=\"918\">\n<tbody>\n<tr>\n<td width=\"31\"><\/td>\n<td width=\"545\"><\/td>\n<td width=\"114\">Rutgers<\/td>\n<td width=\"114\">Non-Rutgers<\/td>\n<td width=\"114\">Corporate<\/td>\n<\/tr>\n<tr>\n<td>1<\/td>\n<td>Atomic Layer Deposition<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 40<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 65<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 85<\/td>\n<\/tr>\n<tr>\n<td>2<\/td>\n<td>Ebeam (Liquid N2)<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 35<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 55<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 75<\/td>\n<\/tr>\n<tr>\n<td>3<\/td>\n<td>Ebeam (Angstorm)<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 45<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 65<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 85<\/td>\n<\/tr>\n<tr>\n<td>4<\/td>\n<td>Ion Milling (Angstorm)<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 45<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 65<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 85<\/td>\n<\/tr>\n<tr>\n<td>5<\/td>\n<td>PECVD (Plasma Therm)<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 40<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 60<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 80<\/td>\n<\/tr>\n<tr>\n<td>6<\/td>\n<td>PECVD (Unaxis)<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 40<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 60<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 80<\/td>\n<\/tr>\n<tr>\n<td>7<\/td>\n<td>Reactive Ion Etch (Trion)<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 40<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 60<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 80<\/td>\n<\/tr>\n<tr>\n<td>8<\/td>\n<td>Rapid Thermal Anneal<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 25<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 45<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 65<\/td>\n<\/tr>\n<tr>\n<td>9<\/td>\n<td>Plasma Etcher (Low Vac)<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 25<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 45<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 65<\/td>\n<\/tr>\n<tr>\n<td>10<\/td>\n<td>Sputter (Denton-Explorer)<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 35<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 55<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 75<\/td>\n<\/tr>\n<tr>\n<td>11<\/td>\n<td>Sputter (Sys &amp; Des Fab)<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 35<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 55<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 75<\/td>\n<\/tr>\n<tr>\n<td>12<\/td>\n<td>Furnace (Boron)<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 50<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 70<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 90<\/td>\n<\/tr>\n<tr>\n<td>13<\/td>\n<td>Furnace (Phosphorus)<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 50<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 70<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 90<\/td>\n<\/tr>\n<tr>\n<td>14<\/td>\n<td>Furnace (Oxidation)<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 50<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 70<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 90<\/td>\n<\/tr>\n<tr>\n<td>15<\/td>\n<td>Furnace (Anneal\/FGA)<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 50<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 70<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 90<\/td>\n<\/tr>\n<tr>\n<td>16<\/td>\n<td>Box Furnace (Thermcraft)_O2 and N2 only<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 35<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 55<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 75<\/td>\n<\/tr>\n<tr>\n<td>17<\/td>\n<td>Box Furnace (ThermoScientific)_FGA and N2 only<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 35<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 55<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 75<\/td>\n<\/tr>\n<tr>\n<td>20<\/td>\n<td>Laser Scribing, Marking and Ablation (Innotech)<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 15<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 35<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 55<\/td>\n<\/tr>\n<tr>\n<td>21<\/td>\n<td>Ozone Dissolved Deionized Water<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 35<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 55<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 75<\/td>\n<\/tr>\n<tr>\n<td>22<\/td>\n<td>Wafer Spin Rinse Dryer<\/td>\n<td>\u00a0*<\/td>\n<td>\u00a0*<\/td>\n<td>\u00a0*<\/td>\n<\/tr>\n<tr>\n<td>23<\/td>\n<td>Lithography (Resist Spinner, Mask Aligner, Bake, Developing)<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 45<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 65<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 85<\/td>\n<\/tr>\n<tr>\n<td>24<\/td>\n<td>Lithography (Partial) &#8212; Mask Aligner only<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 20<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 40<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 60<\/td>\n<\/tr>\n<tr>\n<td>25<\/td>\n<td>Lithography (Partial) &#8212; Spin Resist and Bake only<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 20<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 40<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 60<\/td>\n<\/tr>\n<tr>\n<td>26<\/td>\n<td>Lithography (Partial) &#8212; Wet Benches for Resist Development and Strip<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 20<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 40<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 60<\/td>\n<\/tr>\n<tr>\n<td>27<\/td>\n<td>Wet Bench_Stainless Steel (Solvent Only)<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 20<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 40<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 60<\/td>\n<\/tr>\n<tr>\n<td>28<\/td>\n<td>Wet Bench #1 (Surface Clean Application)<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 20<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 40<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 60<\/td>\n<\/tr>\n<tr>\n<td>29<\/td>\n<td>Wet Bench #2 (Cr or Au Etching)<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 35<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 55<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 75<\/td>\n<\/tr>\n<tr>\n<td>30<\/td>\n<td>Wet Bench #3 (FeCl3 only)<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 25<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 45<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 65<\/td>\n<\/tr>\n<tr>\n<td>31<\/td>\n<td>Detek Non-Contact Profilometer<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 25<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 45<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 65<\/td>\n<\/tr>\n<tr>\n<td>32<\/td>\n<td width=\"545\">Ultra Tech Mask Cleaner<\/td>\n<td>\u00a0*<\/td>\n<td>\u00a0*<\/td>\n<td>\u00a0*<\/td>\n<\/tr>\n<tr>\n<td>33<\/td>\n<td>4-Point-Probe (Ossila)<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 25<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 45<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 65<\/td>\n<\/tr>\n<tr>\n<td>34<\/td>\n<td>Film Metric<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 25<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 45<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 65<\/td>\n<\/tr>\n<tr>\n<td>35<\/td>\n<td>Optical Microscope<\/td>\n<td>\u00a0*<\/td>\n<td>\u00a0*<\/td>\n<td>\u00a0*<\/td>\n<\/tr>\n<tr>\n<td>36<\/td>\n<td>UV &amp; Solar Simulator<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 35<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 55<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 75<\/td>\n<\/tr>\n<tr>\n<td>37<\/td>\n<td>Sinton Carrier Lifetime Tester<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 25<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 45<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 65<\/td>\n<\/tr>\n<tr>\n<td>38<\/td>\n<td>Film Sense Ellipsometry<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 25<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 45<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 55<\/td>\n<\/tr>\n<tr>\n<td>39<\/td>\n<td>Scanning Electron Microscope<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 45<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 65<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 85<\/td>\n<\/tr>\n<tr>\n<td>40<\/td>\n<td>Electron-beam Lithography EBL (including PMMA Spin, Bake and Develop)<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 70<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 90<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 100<\/td>\n<\/tr>\n<tr>\n<td>41<\/td>\n<td>Electron-beam Lithography EBL only (without PMMA Spin, Bake and Develop)<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 55<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 75<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 95<\/td>\n<\/tr>\n<tr>\n<td>42<\/td>\n<td>Cleanroom Access (flat rate the whole day)<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 15<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 35<\/td>\n<td>\u00a0$\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 45<\/td>\n<\/tr>\n<tr>\n<td style=\"text-align: right\" colspan=\"5\">* included in the cleanroom access fee<\/td>\n<\/tr>\n<tr>\n<td style=\"text-align: right\" colspan=\"5\">add $25\/hr for processes requiring cleanroom staff&#8217;s assistance<\/td>\n<\/tr>\n<tr>\n<td style=\"text-align: right\" colspan=\"5\">Non-Rutgers includes academic institutes and startup companies<\/td>\n<\/tr>\n<tr>\n<td style=\"text-align: right\" colspan=\"5\">Unlimited cleanroom access and usage fee for the whole year is $5,000\/per person.<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n","protected":false},"excerpt":{"rendered":"<p>Fabrication Tools Atomic Layer Deposition Ebeam (Liquid N2) Ebeam (Angstorm) Ion Milling (Angstorm) PECVD_Plasma Therm PECVD_Unaxis Trion Reactive Ion Etch Plasma Treatment_Barrel Etcher Rapid Thermal Anneal Sputter_Denton-DV502 Sputter_Sys &amp; Des &hellip; <a href=\"https:\/\/sites.rutgers.edu\/ncf\/capabilities-and-charges\/\" class=\"\">Read More<\/a><\/p>\n","protected":false},"author":455,"featured_media":0,"parent":0,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"","meta":{"_acf_changed":false,"footnotes":""},"class_list":["post-826","page","type-page","status-publish","hentry"],"acf":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v23.5 - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ -->\n<title>Capabilities and Charges - Nanofabrication CORE Facility<\/title>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/sites.rutgers.edu\/ncf\/capabilities-and-charges\/\" \/>\n<meta property=\"og:locale\" content=\"en_US\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Capabilities and Charges - Nanofabrication CORE Facility\" \/>\n<meta property=\"og:description\" content=\"Fabrication Tools Atomic Layer Deposition Ebeam (Liquid N2) Ebeam (Angstorm) Ion Milling (Angstorm) PECVD_Plasma Therm PECVD_Unaxis Trion Reactive Ion Etch Plasma Treatment_Barrel Etcher Rapid Thermal Anneal Sputter_Denton-DV502 Sputter_Sys &amp; 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